PROTECTION AGAINST OXIDATION OF C/SiC COMPOSITES BY CHEMICAL VAPOUR DEPOSITION OF TITANIUM DIBORIDE: DEPOSITION KINETICS AND OXIDATION BEHAVIOUR OF FILMS PREPARED FROM TiCl4/BCl3/H2 MIXTURES
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چکیده
Ti82 coatings were deposited by hydrogen reduction of Tic14 and BCl3. The objective was to correlate process variables with thermodynamic equilibrium calculations, deposition kinetics, coating stucture and properties. Particular emphasis was given to obtaining deposits having appropriate oxidation resistance to protect CISiC composites. Fi lms, obtained at moderate temperature (800°C), acted as self-healing external barriers below the microcracking temperature of the outer Sic coating used as primary oxygen protection.
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